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Notice

A RESERCH POSITIONS FOR POSTDOC

We look for applicants with background in one or more of the following areas:

Microelectronics、Mechanical Engineering &Physics

For more information, please contact Prof. Wang


Li Ding has finished his PhD

Li Ding has finished his PhD last year at the Department of Optics and Optical Engineering, University of Science and technology of China(USTC). He always works so hard and has done a great job in the area of nanoscale ridge apertures.We thank him for his contributions in our group.Best wishes for his future research work!

December, 2016

PH75218

Great progress in high resolution lithography

Recently, the research group of Prof. WANG Liang made great progress in 16 nm-resolution lithography. A highly confined electric near field is produced by localized surface plasmon excitation and nanofocusing of the closely-tapered gap. We show contact lithography results with a record 16 nm resolution (FWHM).The corresponding result has been published in Nanotechnology [Nanotechnology 28 (2017) 055302].

we have presented NSOL using bowtie apertures with a sub-15 nm gap, which are fabricated using the backside milling method. Combined with the passive flexure stage for contact control, we have realized a record 16 nm resolution lithography. By further decreasing the gap size of the bowtie aperture via combining the proximity milling technique and optimizing the contact condition, the near-field lithography resolution promises further refinement in the future. This low-cost photolithography scheme can find its potential applications in data storage, energy harvesting, highspeed computation and so on.

Jin QIN is the author of this paper. The financial support to this work by University of Science and Technology of China start-up funding, the National Key Basic Research Program of China (No.2013CBA01703), the Fundamental Research Funds for the Central Universities (No.WK2030380008) and the National Natural Science Foundation of China (NSFC) (No. 11104260) are acknowledged.