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Multilayer Dielectric Grating                                     back

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Multilayer dielectric gratings with high diffraction efficiency and high laser damage threshold play an important role in the high power laser applications. Multilayer dielectric grating is usually fabricated by using holographic lithography and ion-beam etching method. We focus on the reactive ion beam etching of the multilayer dielectric gratings. The following figures show the multilayer dielectric gratings we have etched using CHF3. The multilayer dielectric gratings exhibit an efficiency of about 95% in the -1 order at TE polarization of 1 064 nm light at Littrow mounting.

Multilayer diffraction gratings with HfO2 as the top layer Multilayer diffraction gratings with SiO2 as the top layer

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Improvement of the etching technique

On-line optical measurement setup and method of scanning ion-beam etching of multilayer dielectric gratings

The on-line diffraction intensity measurement system of diffractive intensity is an important part of the etcher during the etching process of a multilayer diffraction grating. The feature of our on-line measurement is that the 1D (1-Dimensional) diffractive intensity distribution of the grating is on-line measured, not the diffractive intensity of a fixed position on the grating is in-situ monitored. The following figures show (a) the schematic diagram of scanning etching and on-line diffractive intensity measurement system, and (b) The 1D distribution of the grating intensity in the -1 order after every two etching periods.
(a) Schematic diagram of scanning etching and on-line measurement system.
(b) The 1D distribution of the grating intensity in the -1 order after every two etching periods.

For more information on multilayer dielectric gratings, please see:

  • Journal Papers

    1. Liu Ying, Xu Dequan, Xu Xiangdong, Zhou Xiaowei, Hong Yilin, and Fu Shaojun, ¡°Characteristics of several common optical materials in ion beam etching,¡± Journal of University of Science and Technology of China (in Chinese), 37(4): 536-538,553 (2007).

    2. Wang Xudi, Liu Ying, Xu Xiangdong, Fu Shaojun, and Cui Zheng, ¡°Reactive ion beam etching of HfO2 film and removal of sidewall redeposition,¡± Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 24(4): 1067-1072, (2006).

    3. Wang Xudi, Liu Ying, Hong Yilin, Fu Shaojun, and Xu Xiangdong, ¡°Reactive ion etching of HfO2 films,¡± Vacuum Science and Technology (In Chinese), 24(4): 313-316, (2004).

    4. Wang Xudi, Liu Ying, Xu Xiangdong, Hong Yilin, and Fu Shaojun, ¡°Ion beam etching of quartz and BK7 glass,¡± Vacuum Science and Technology (In Chinese), 24(4): 397-400, (2004).

    Conference papers

    1. Ying Liu, Xiangdong Xu, Yilin Hong, Dequan Xu, and Shaojun Fu, ¡°Reactive ion beam etching of multilayer diffraction gratings with SiO2 as the top layer,¡± Proc. SPIE, 6832, 68322O-1-5, (2007).

    2. Ying Liu, Dequan Xu, Xiangdong Xu, Yilin Hong, and Shaojun Fu, ¡°Reactive ion beam etching of large-aperture multilayer diffraction gratings by radio frequency ion beam source,¡± Proc. SPIE, 6724, 67240K-1-5, (2007).

    3. Xiaowei Zhou, Dequan Xu, Ying Liu, Xiangdong Xu, and Shaojun Fu, ¡°Amending the uniformity of ion beam current density profile,¡± Proc. of SPIE, 6832 68322N-1-6, (2007).

    Patents

    1. Liu Ying, Xu Xiangdong, Hong Yilin, Xu Dequan, Fu Shaojun, On-line optical measurement setup and method of scanning ion-beam etching of diffraction gratings,  Chinese patent No. 200710020220.0 (Pending).

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Last Update:2008-10-20

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