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等离子体源技术与物理实验室 |
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| Laboratory of Plasma Source Technology and Physics | |
论文发表：
·Z. L. Tang, K. Yang, H. X. Liu, Y. C. Zhang, H. Li, and X. D. Zhu* Dynamics of cathode spots in low-pressure arc plasma removing oxide layer on steel surfaces Physics of Plasmas, 23, 033501 (2016) ·Z. L Tang, R. M. Wu, S. D. Yang, K. Yang, Y. C. Zhang, H. X. Liu, X. D. Zhu*, Interaction Between Arc Spot Plasma and Steel Surface in Descaling IEEE Transaction on Plasma Science, 43(5)，1793(2015) ·Y.C. Zhang, X.H. Xie, H. Li, K. Yang, Z.L. Tang, X.D. Zhu* Influence of mixture compositions on ion energy distributions in Ar/N2 electron cyclotron resonance plasma Vacuum, 119 , 174 (2015) ·F. Ding, S. J. Zheng, B. Ke, Z. L. Tang, Y. C. Zhang, K. Yang, Xie X. H., and X. D. Zhu* Characterization of self-adjusting for steady-state, direct current cathode-dominated glow discharge plasmas at high pressures Chin. Phys. Lett., 30(8), 085201(2013) ·S. J. Zheng, Y. C. Zhang, B. Ke, F. Ding, Z. L. Tang, K. Yang, and X. D. Zhu* Dynamic characteristics of gas-water interfacial plasma under water Physics of Plasmas, 19, 063507(2012). · B. Ke, M. D. Chen, F. Ding, S. J. Zheng, H. Li, X. D. Zhu* Cu-doped SiOxCy nanostructures induced by radio frequency plasma jet using Hexamethyldisiloxane Applied Surface Science 258(2011) 1149 · L. Wang, B. Ke, T. L. Ni, F. Ding, M. D. Chen, X. D. Zhu* Role of bias frequency in a dual electron cyclotron resonance-radio frequency hybrid Plasma Vacuum, 84, 348(2010). ·L. Wang, X. D. Zhu* Effect of bias in patterning diamond by a dual electron cyclotron resonance–radio frequency hybrid oxygen Plasma Thin Solid Films, 518，1985(2010). ·L. WANG, H. Y. Wang, B. Ke, F. Ding, M .D. Chen, X. D. Zhu* Effect of Kr addition to ECR-rf hybrid O2 Plasma for patterning diamond surfaces Plasma Science and Technology, 12, (2010) 31. ·H. Y. Zhou, L. Wang, X. D. Zhu, B. Ke, F. Ding, X. H. Wen, Y. N. Wang The parameters of electron cyclotron resonance/radio-frequency hybrid hydrogen plasma adjusted by substrate arrangements Review of Scientific Instruments, 81, (2010) 033501 · Formation of SiC nanostruture using hexamethyldisiloxane during plasma-assisted hot-filament chemical vapor deposition ·M. D. Chen, X. D. Zhu* Plasma Science and Technology, 12, (2010) 547. ·S. Y. Ding, G. C. Yan, X. D. Zhu* Structural Evolution of SiC Films During Plasma-Assisted Chemical Vapour Deposition Plasma Science and Technology, 11, (2009) 159 ·L. Meng, J. Zhang and X. D. Zhu* Carbon cone arrays by double-bias assisted hot filament plasma chemical vapor deposition Thin Solid Films, 516, 2981(2008) · L. Wang, L. Cui, X. D. Zhu* Coupling effect of electron cyclotron resonance hydrogen plasma and dc biasing in fabricating diamond nanotips Physics of Plasmas, 14, 123501(2007). · L. Wang and X. D. Zhu* Effect of substrate facets on homoepitaxial growth of diamonds during plasma-assisted hot filament chemical vapor deposition Diamond & Related Materials, 16(2007)637. ·X. D. Zhu* K. Narumi and H. Naramoto Buckling instability in amorphous carbon films Journal of Physics: Condensed Matter, 19, 236227 (2007). ·F. Ding, L. Meng, and X. D. Zhu* SiC formation through interface reaction between C60 and Si in plasma environment Plasma Science and Technology, 9, (2007) 67-70 ·L. Meng, H. Y. Zhou, and X. D. Zhu* Role of duty ratio in the diamond growth by pulsed DC-bias enhanced hot filament chemical vapor deposition Plasma Science and Technology, 9, (2007) 560-563 ·X. D. Zhu*, F. Ding, H. Naramoto, K. Narumi, AFM Investigation on surface evolution of amorphous carbon during ion beam assisted deposition Applied Surface Science, 253, (2006) 1480-1483 ·L. Wang, G. C. Yan, Y. Li, L. Cui and X. D. Zhu* Bias-induced structural evolution of diamond films in plasma enhanced hot filament chemical vapor deposition with a two-step process J. Phys. D: Appl.Phys. 39(2006)3350-3355 Open air deposition of SiO2 films by an atmospheric pressure line-shaped plasma ·X. D. Zhu*, F. Arefi-Khonsari, C. Petit-Etienne, M. Tatoulian Plasma Processes and Polymers 2, 407-413(2005). ·H. Y. Zhou, R. J. Zhan, X. D. Zhu, X. H. Wen, and X. Chen Chang from micrometer to nanometer size for diamond grains by plasma chemically vapor deposition Nanotechnology 15, 1609,2004 ·X. D. Zhu*, K. Narumi, Y. Xu, H. Naramoto, and F. Arefi-Khonsari Self-organized textured surfaces of amorphous carbon Journal of Applied Physics, 95, 4105 (2004). ·X. D. Zhu*, X. H. Wen, R. J. Zhan, H. Naramoto, and F. Arefi-Khonsari Control of characteristic lengths for self-organized nanostructures of amorphous carbon Journal of Physics: Condensed Matter, 16, 1175-1181 (2004). ·X. D. Zhu*, Y. H. Xu, H. Naramoto Ion beam assisted hexagonal diamond formed from C60 fullerene Journal of Physics: Condensed Matter, 15, 2899 (2003). ·Ru-Juan Zhan, Xiaohui Wen, Xiaodong Zhu, Aidi zhao Adjustment of electron temperature in ECR microwave plasma Vacuum 70(2003)499-503 ·X. D. Zhu*, H. Naramoto, Y. Xu, K. Narumi: Coarsening dynamics and surface stability during ion-beam-assisted amorphous diamondlike carbon films Physical Review B 66, 165426(2002). ·X. D. Zhu*, H. Naramoto, Y. Xu, K. Narumi Tuning surface morphologies of ion-assisted diamond-like carbon film on nanometer scale Journal of Chemical Physics, 116(23), 10458 (2002). ·X. D. Zhu*, Y. Xu, H. Naramoto, K. Narumi et. al., Effect of simultaneous Ne+ ion bombardments on bonding structure of carbon films deposited from thermally evaporated C60 fullerence Journal of Physics: Condensed Matter, 14, 5083 (2002). ·H. Naramoto, X. D. Zhu, Y. Xu, K. Narumi, J. Vacik, Allotropic conversion of carbon-related films by using energy beams Physics of the Solid State 44(4), 668(2002). Optical properties of bias-induced CH4-H2 plasma for diamond film deposition J. Vac. Sci. Technol. A 20(3), 941 (2002). ·C. F. Wu, R. J. Zhan, X. D. Zhu, W. D. Huang, A homogeneous microwave plasma and its application in material surface modification Surface & Coating Technology 131, 26 ( 2000). ·X. D. Zhu*, H. Wang et al., Investigations of Ta film resistors on chemically vapor deposited diamond plates Applied Surface Science 153, 19 (1999). ·X. D. Zhu*, R. J. Zhan Science in China A 42(3), 332 (1999). Plasma environment during hot cathode direct current discharge plasma chemical vapor deposition of diamond films ·X. D. Zhu*, M. Hu, R. J. Zhan Diagnostic of plasma emission spectra during electron assisted chemical vapor deposition of diamond films Physics of Plasmas 5(5), 1541 (1998) ·X. D. Zhu*, H. Y. Zhou, R. J. Zhan et al Early formation of thick diamond films on Si substrates Applied Surface Science 136, 345 (1998). ·X. D. Zhu* , M. Hu, R. J. Zhan et al. Investigation of the role of discharge current density in diamond synthesis during filament-enhanced plasma assisted CVD Journal of Physics D 31, 3327 (1998). ·R. J. Zhan, C. Y. Wang, X. H. Wen, X. D. Zhu, Plasma nitriding in low pressure in an ECR microwave plasma Surface & Coating Technology 105, 72 (1998).
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